Course 2009

JePPIX Course/Training on Photonic Integration Technology 2009

JePPIX Design and Technology

The fourth JePPIX training course runs from November 9th until November 20th 2009.

Venue - Technical University of Eindhoven

Cost - The charges for (part of) the two-week course will be € 1000. For academic participants there is a 50% discount: € 500. Participants will get a binder with course material and daily lunches. Attendees are expected to pay for their own subsistence and accommodation whilst in Eindhoven. There is a wide range of places to stay in the town. A summary is found in this document.

Course Outline:

1st week: Design of Photonic Circuits (Led by Xaveer Leijtens from COBRA and Arjen Bakker from PhoeniX). The week's programme is split into lectures and practical training in the design software

2nd week: Photonic Integration Technology (Led by Richard Nötzel and Huub Ambrosius, both from COBRA).

The mornings will largely be reserved for lectures and the afternoons for training in the clean room and for practical studies on the software tools on the optical measurement of InP-based passive waveguides.

Preliminary details of the programme are given below:

Programme week 1: 9th - 13th November

Time:	Monday:	Tuesday:	Wednesday:	Thursday:	Friday:
Morning	Introduction in PICs (MS)	Multi-layer waveguides (XL)	Junctions and Couplers (XL)	SOAs: structures, basic properties, amplification and thermal issues (EB)	Arrayed Waveguide Gratings (XL)
	Wave Equation modes, bv-diagram (XL)	Curved waveguides (XL)	Mode Solvers (JB:PhoeniX)	MMI couplers (XL)	Mask Design (XL)
	Three layer Waveguides (XL)	Introduction to PhoeniX structure definition (AB:PhoeniX)	Beam Propagation: BPM,FDTD	Arrayed Waveguide Gratings (XL)	SOAs: lasers and Signal Processing (EB)
Afternoon	Software installation and ADS Tutorial (XL)	Tools, parameterized designs (AB: PhoeniX)	Modesolvers and BPM (AB,JB: PhoeniX)	ADS Assignments (1) (XL)	ADS Assignments (2) (XL + Phoenix) and AWG simulation (RS)

Programme week 2: 16th - 20th November

Time:	Monday:	Tuesday:	Wednesday:	Thursday:	Friday:
Morning	MOVPE, MBE and CBE basics (1) (RN)	Optical characterization (RN)	PECVD (HA)	Process tolerances and device design (HA)	Mask design (XL)
	MOVPE, MBE and CBE basics (2) (RN)	Regrowth technology (RN)	RIE Metallisation (HA)	Fabry-Perot/demo Mode Locked Laser (HA)
	Structural and electrical characterization (RN)	InAs/InP quantum dot laser (RN)	Processing of WG-SOA (HA)		Discussion and Evaluation Session
Afternoon	Crystal Structure, Notions of Vacuum, Lithography/Processing Waveguides (HA)	Clean room processing (1) (HA)	Clean room processing (2) (HA)	Mask design (XL)